Query on lithography parameters of default kernels + Request for precomputed kernels (λ=193nm, NA=0.85)

[mmx-Lv]

Hi!
I'm using LithoBench to reproduce a linear regression-based OPC method, and need to align with the literature's lithography parameters: λ=193nm, NA=0.85, and annular illumination (σ=0.88/0.44).

I added these to config/lithosimple.txt, but the printed image (attached, right) is blurred (original mask on left is sharp). I suspect the default ./kernel files were precomputed with different parameters.
Could you help with two requests:

1. What lithography parameters (wavelength, NA, illumination) were used for the default kernels?
2. If convenient, could you share precomputed kernels for λ=193nm and NA=0.85?

Thanks for your time and the great work on LithoBench!
Attached: Verification result (original mask vs. printed image with default kernel)

[shelljane]

Thank you for your interest in our work. The optical kernels in OpenILT are based on those from the ICCAD-2013 contest and likely do not correspond to a λ=193 nm, NA=0.85 configuration. If you require a configurable light source, we recommend using the lithography simulator available in TorchLitho-Lite (https://github.com/OpenOPC/TorchLitho-Lite).